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Carbon nanotube synthesis plant CVDomna

Description

The device for synthesis of carbon nanotubes on substrates and complex structures by method of catalytic pyrolysis of liquid and gaseous carbon-content mixes.

Assignment

Installation CVDomna can be applied for carbon nanotube growth both in research work and in educational process.

Using technology of chemical sedimentation from gas phase installation CVDomna allows receiving carbon nanotubes both as a material, and as structural elements of micro- and nanosistem devices.

The offered technique allows to investigate received nanotube material without preliminary clearing. This is achieved by oxidation of amorphous and weakly-structured carbon with products of ethanol decomposition reaction.

Application

CVDomna can be applied both in research, and in educational process for synthesis of various kinds of carbon nanotubes by method of catalitic pyrolysis of carbon-containing vapor-gas mixes. Synthesis can be carried out on substrates and complex structures. Besides CVDomna provides possibility of carrying out laboratory practical works and applied researches of processes of carbon nanotubes synthesis in high schools and universities. The installation can be applied for training of students and post-graduate students, retraining of specialists of educational and research departments of institutes and universities.

Specification

№	Description	Quantity
1	Reactionary chamber	1
2	Vapor cell	1
3	Low-vacuum pump	1
4	Training of the personnel and commission works	1
5	Collection of laboratory works	1
6	Set of catalytic structures	1

Technical characteristics

Dimensions of installation
Width, mm	650
Depth, mm	340
Height, mm	290
Weight (no more), kg	20
Characteristics of heating
The maximal temperature, °С	1100
Speed of heating, °С/minutes	130
Precision of temperature setting, °С	1
Precision of temperature maintenance, °С	± 5
Resource of a heater (not less), hours	4000
Power consumption (no more), Wt	2500
Programming
Amount of programs in non-volatile memory	100
Error monitoring	exist
The maximal process duration, minutes: seconds	59:59
The chamber of growth
Material of walls	Quartz glass
Material of a substrate	Quartz ceramics
Amount of spare substrates, units	2
Diameter, mm	95
Height, mm	58
Pressure with the closed valve (no more), kPa	0,2
System of vapor-gas mixes submission
Chamber volume, ml	250
The maximal pressure of vapor-gas mixes, kPa	200
The maximal temperature, °С	80

Developer

Moscow Institute of Electronic Technology (Technical University) (TU MIET)

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