Financing

Beginning of R&D: before 2007.

Financing sources: budjet—70 %, other sources—30 %.

Brief description

The reference standard is composed of nanorelief pitch structure, formed on the silicon surface and is meant for calibration (verification) of linear sizes measuring means: scanning electron (SEM) and atomic force (AFM) microscopes, used in micro- and nanoelectronics and nanotechnologies. Small series manufacturing is developed. This product is patented (Russian Federation Patent on Invention # 2325619 with the priority from 19.04.2006)

This standard allows to determine all microscopes parameters, is a uniform measure for SEM and AFM with ideal relief shape. It is the only measure in the world of a line width in nanoscale (from 5 nm to 700 nm) and has no analogs. On its basic are worked out 7 national standards of Russian Federation (GOST R): 8.628-2007, 8.629-2007, 8.630-2007, 8.631-2007, 8.635-2007, 8.636-2007, 8.644-2008.

Main competitive advantages

This MShPS-2.0K standard allows to conduct the complete calibration of SEM and AFM (including the measuring of microscope probe size) for measurement of relief element linear sizes is broad range 5nm–100 m, including the line width up to 5nm.

Nowadays any other test objects for measuring the line width less than 100 nm do not exist. The MShPS-2.0 K allows to calibrate the scanning electron microscopes (CDSEM), used in microchips manufacturing with the critical size (CS) up to 20 nm. It will be enough to ensure not only the contemporary production (CS=32), but also the production for 10 years ahead. This test object went off the international collation.

Scientific significance

With the world priority the series of solid state surface nanorelief reference standard was created, using the substance natural constants. This test object is made of monosilicon and corresponds relief pitch structures—the trapezoidal shape protrusions and trenches, each side of which coincides with crystallographic planes (111) or (100) of silicon. The attested (standard) test object parameters are the pitch, the upper and lower protrusion and trench bases sizes, the height (depth) of the relief and the projections of lateral inclined walls on the structures base planes. In series production all test objects have the same pitch size, but differ by width sizes within the range 5-700 nm and by relief depths within 100–1500 nm.

The manufacturing technology includes several “know-hows”; the transfer of those is not intended. Nowadays the small series of these standard are sold to the customers.

Practical application examples

The Multiple-Access Centers of Russian Federation (MAC) and the Scientific Educational Centers (SEC), using the unique measuring devices, are equipped by these standards. The MACs and SECs are conducting the personnel teaching and training for nanotechnologies. The Certification Centers of nanoindustry production are also using the standards. The price of MShPS-2.0K with software for processing of measurement results, made on SEM and AFM: one million rubles.

Markets geography

The reference standards MShPS-2.0K are sold in Russia, Belarus, Germany. The delivery to the US, Japan and China is planned.

Markets volume

The approximate outlet volume: 30 million rubles. The timing of order: 1 month. The cost efficiency is more than 15 million rubles per annum.

Developer

Center for Surface and Vacuum Research (CSVR)